Electron-beam-induced damage in self-assembled monolayers


Kannan Seshadri, Karl Froyd, Atul N. Parikh, David L. Allara, Michael J. Lercel, Harold G. Craighead, Journal of Physical Chemistry 100, 15900 (1996)

Highly organized monolayers formed from the self-assembly of octadecyl derivatives on oxide-covered Si and Ti substrates have been exposed to electron beam impact under typical conditions used in lithographic patterning. A combination of X-ray photoelectron spectroscopy, ellipsometry, infrared spectroscopy, and liquid drop contact angle measurements show that the major effect of irradiation is the loss of H, via cleavage of C−H bonds, to form a carbonaceous residue with a surface containing oxygenated functional groups.