Kannan Seshadri, Karl Froyd, Atul N. Parikh, David L. Allara, Michael J. Lercel, Harold G. Craighead, Journal of Physical Chemistry 100, 15900 (1996)

Highly organized monolayers formed from the self-assembly of octadecyl derivatives on oxide-covered Si and Ti substrates have been exposed to electron beam impact under typical conditions used in lithographic patterning. A combination of X-ray photoelectron spectroscopy, ellipsometry, infrared spectroscopy, and liquid drop contact angle measurements show that the major effect of irradiation is the loss of H, via cleavage of C−H bonds, to form a carbonaceous residue with a surface containing oxygenated functional groups.