Photochemical pattern transfer and enhancement of thin film silica mesophases


Andrew M. Dattelbaum, Meri L. Amweg, Laurel E. Ecke, Chanel K. Yee, Andrew P. Shreve, and Atul N. Parikh, Nano Letters 3, 719 (2003)

Here we present a spatially directed calcination approach based on masked UV exposure to pattern mesoporous regions within a mesostructured matrix in a rapid, single-step, and inexpensive manner. Subsequent chemical treatment of the film can selectively remove the mesostructured regions, leading to patterned mesoporous structures. Such tunability in the processing under near room-temperature conditions allows for spatial control and patterning of function related to optical properties, topology, porosity, hydrophobicity, and structural morphology of the mesoscopic thin film material on a wide range of substrates.