Andrew M. Dattelbaum, Meri L. Amweg, Laurel E. Ecke, Chanel K. Yee, Andrew P. Shreve, and Atul N. Parikh, Nano Letters 3, 719 (2003)

Here we present a spatially directed calcination approach based on masked UV exposure to pattern mesoporous regions within a mesostructured matrix in a rapid, single-step, and inexpensive manner. Subsequent chemical treatment of the film can selectively remove the mesostructured regions, leading to patterned mesoporous structures. Such tunability in the processing under near room-temperature conditions allows for spatial control and patterning of function related to optical properties, topology, porosity, hydrophobicity, and structural morphology of the mesoscopic thin film material on a wide range of substrates.